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Photoinduced Paramagnetic Defects on Silicon Surface
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1974
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Dissociative Water AdsorptionEngineeringPhysicsPhotochemistrySurface ChemistryNatural SciencesSurface ScienceApplied PhysicsSilicon SurfaceDefect FormationLight AbsorptionPhotopolymer NetworkChemistrySilicon On InsulatorDefect ToleranceOptoelectronicsEsr Absorption Lines
Two photoinduced ESR absorption lines are observed at high resistivity silicon surfaces which are chemically etched and followed to rinse with water. It is found that these centers are associated with dissociative water adsorption on surface structural hydroxyl groups and become parama-gnetic by trapping photoexcited excess free carriers.