Ion-implanted InGaAsP avalanche photodiode

Abstract

High-quantum-efficiency planar and mesa InGaAsP avalanche photodiodes have been fabricated by beryllium ion implantation. The implanted diodes, after suitable annealing, exhibited a very low dark current density of 4.0×10−6 A/cm2 at 10 V. The devices have 65% external quantum efficiency at 1.06 μm without an antireflection coating and a uniform avalanche gain of 12.