Publication | Closed Access
X-ray total-external-reflection–Bragg diffraction: A structural study of the GaAs-Al interface
584
Citations
3
References
1979
Year
Materials ScienceAluminium NitrideInterface StructureEngineeringPhysicsCrystal Growth TechnologySurface ScienceApplied PhysicsX-ray DiffractionSemiconductor MaterialTotal External ReflectionMolecular Beam EpitaxyMolecular BeamEpitaxial GrowthCrystallographyInterface RegionX-ray Total-external-reflection–bragg Diffraction
A new technique utilizing conventional x-ray diffraction in conjunction with total external reflection has provided a powerful tool for studying ordered interfaces and surface phenomena. It has been used in this work to study the details of the interface region of a molecular beam epitaxially grown Al single crystal on a molecular beam epitaxially grown GaAs single-crystal substrate. A simple model including variations of the lattice parameter and disorder in the interface region is in agreement with these experimental results.
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