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Patterning of SnO<sub>2</sub> Thin Films by Combination of Lithographic Photoirradiation and Pyrolysis of an Organotin Polymer
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Citations
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References
1997
Year
Sno2 Thin FilmsEngineeringSynthetic PhotochemistryThin Film Process TechnologyChemistryPolymersLithographic PhotoirradiationPhotocatalysisPhotopolymer NetworkPolymer ChemistryThin Film ProcessingNanolithography MethodMaterials SciencePhotochemistryMechanistic PhotochemistryOrganotin PolymerPhotochromismPolymer ScienceThin Films
A lithographic photoirradiation and following pyrolysis of organotin polymer (poly(4-((trimethylstannyl)methyl)styrene)) thin films afforded a pattern of SnO2 thin films, where photochemical cross-linking of the polymer was necessary for the formation of the SnO2 films during the pyrolysis.
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