Removal efficiency of organic contaminants on Si wafer by dry cleaning using UV/O3 and ECR plasma

<i>I</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> cleaning of silicon substrate surfaces by remote plasma-excited hydrogen

B. Anthony, L. Breaux, Tsan‐sheng Hsu et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 128 citations

Natural Sciences, Materials Engineering, Materials Science +17

Identification and Removal of Trace Organic Contamination on Silicon Wafers Stared in Plastic Boxes

Koichiro Saga, Takeshi Hattori · Journal of The Electrochemical Society · 1996 · 108 citations

Engineering, Materials Engineering, Materials Science +17

Single-wafer integrated semiconductor device processing

Masoud Moslehi, R. A. Chapman, Man Wong et al. · IEEE Transactions on Electron Devices · 1992 · 96 citations

Engineering, Electrical Engineering, Manufacturing Engineering +17

Remote plasma-enhanced chemical-vapor deposition of epitaxial Ge films

R. A. Rudder, G. G. Fountain, R. J. Markunas · Journal of Applied Physics · 1986 · 79 citations

Natural Sciences, Materials Engineering, Materials Science +16

Effect of organic contaminants on the oxidation kinetics of silicon at room temperature

Antonino Licciardello, Orazio Puglisi, S. Pignataro · Applied Physics Letters · 1986 · 77 citations

Natural Sciences, Materials Engineering, Materials Science +17