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Irreversibility field up to 42 T of GdBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-δ</sub>thin films grown by PLD and its dependence on deposition parameters
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Citations
14
References
2010
Year
Materials ScienceEpitaxial GrowthEngineeringDeposition ParametersPulsed Magnetic FieldsSurface ScienceApplied PhysicsCondensed Matter PhysicsSuperconductivityThin Film Process TechnologyThin FilmsPulsed Laser DepositionChemical DepositionIrreversibility FieldSingle Crystalline Laalo3Chemical Vapor DepositionThin Film Processing
We investigated the irreversibility field of GdBa2Cu3O7 − δ thin films grown epitaxially by pulsed laser deposition on single crystalline LaAlO3(100) substrates in pulsed magnetic fields up to 42 T and at temperatures between 50 and 100 K. The critical temperature Tc reached values of 93.5 K with a ΔTc of 0.6 K and an inductively measured self-field critical current density Jc at 77 K of 3.7 MA cm − 2. The pulsed magnetic field measurements yield a strong dependence of Hirr on the deposition rate, but the film thickness has a small influence on the resistive transition in high magnetic fields. A maximum irreversibility field Hirr of 40.1 T was measured at a temperature of 50 K for a 300 nm thick film.
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