Publication | Open Access
Fabrication of Complex Three-Dimensional Nanostructures from Self-Assembling Block Copolymer Materials on Two-Dimensional Chemically Patterned Templates with Mismatched Symmetry
118
Citations
31
References
2006
Year
EngineeringMolecular Self-assemblyNanostructured PolymerChemistryMismatched SymmetryNanolithography MethodMaterials ScienceDiblock CopolymerHierarchical AssemblyTwo-dimensional Chemically3D PrintingBlend MorphologyBlock Co-polymersNanomaterialsFilm ThicknessSelf-assemblyPolymer ScienceApplied PhysicsNatural SciencesComplex Three-dimensional NanostructuresPolymer Self-assembly
A study is presented of the self-assembly of a lamella-forming blend of a diblock copolymer and its respective homopolymers on periodically patterned substrates consisting of square arrays of spots, that preferentially attract one component, as a function of pattern dimensions and film thickness. The blend morphology follows the pattern at the substrate and forms a single quadratically perforated lamella (QPL). At intermediate film thicknesses necks connect this QPL to the film surface, resulting in a bicontinuous morphology. The necks do not register with the underlying square lattice but exhibit a substantial amount of hexagonal short-range order. For thicker films we observe bicontinuous morphologies consisting of parallel lamellae with disordered perforations. These results demonstrate a promising strategy for the fabrication of complex interfacial nanostructures from two-dimensional chemically patterned templates.
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