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Low-frequency noise in self-aligned bipolar transistors
41
Citations
20
References
1987
Year
Semiconductor TechnologyElectrical EngineeringPolysilicon EmitterEngineeringPhysicsAdjacent TransistorsElectronic EngineeringBias Temperature InstabilityApplied PhysicsNoiseLow-frequency NoiseSemiconductor Device FabricationBeyond CmosSemiconductor Device
We report the first study of the low-frequency noise in self-aligned npn bipolar transistors, which use the polysilicon emitter. Some of these devices showed excess noise spectra different from the 1/f law generally observed in diffused junction transistors, and the spectral shape S( f ) was found to vary from sample to sample. For instance, we have observed two different characteristics, S( f )∼1/f and S( f )∼1/[1+( f/f0)2], in two adjacent transistors on the same chip. We attribute the latter to carrier trapping in the oxide barrier at the poly-/monosilicon boundary, whose inhomogeneity could explain the wide variation of the noise spectra.
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