Publication | Closed Access
Deposition rate and three-dimensional uniformity of RF plasma deposited SiOx films
62
Citations
16
References
2001
Year
Materials ScienceSiox FilmsEngineeringSurface ScienceApplied PhysicsDeposition RateThin FilmsChemical Vapor DepositionPlasma ProcessingThin Film ProcessingThree-dimensional Uniformity
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