Effect of processing parameters on the deposition rate of Si3N4/Si2N2O by chemical vapor infiltration and the in situ thermal decomposition of Na2SiF6 - Concepedia

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Effect of processing parameters on the deposition rate of Si3N4/Si2N2O by chemical vapor infiltration and the in situ thermal decomposition of Na2SiF6

11

Citations

6

References

2007

Year

M.I. Pech‐Canul, J. L. de la Peña, A. L. Leal-Cruz

Applied Physics A

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringCorrosionDeposition RateSitu Thermal DecompositionChemical DepositionChemical Vapor InfiltrationChemical Vapor Deposition

References

	Year	Citations

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