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Summary Abstract: Ion-beam sputter deposition of oxide films
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1985
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Materials ScienceEngineeringMaterials FabricationSurface ScienceApplied PhysicsMaterials CharacterizationVacuum ScienceIon BeamThin Film Process TechnologyVacuum DeviceThin FilmsSummary AbstractChemical DepositionChemical Vapor DepositionThin Film ProcessingIon‐beam Sputter DepositionMaterials Interfaces
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation J. R. Sites, H. Demiryont, D. B. Kerwin; Summary Abstract: Ion‐beam sputter deposition of oxide films. J. Vac. Sci. Technol. A 1 May 1985; 3 (3): 656. https://doi.org/10.1116/1.572972 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search