Publication | Closed Access
Strain and Shape of Epitaxial InAs/InP Nanowire Superlattice Measured by Grazing Incidence X-ray Techniques
59
Citations
14
References
2007
Year
Materials ScienceNanoscale ScienceIncidence X-ray DiffractionNanowire ContributionEngineeringPhysicsNanowire Cross-sectionNanotechnologyNanoelectronicsApplied PhysicsSemiconductor MaterialMultilayer HeterostructuresMolecular Beam EpitaxyIncidence X-ray TechniquesEpitaxial GrowthSemiconductor Nanostructures
Quantitative structural information about epitaxial arrays of nanowires are reported for a InAs/InP longitudinal heterostructure grown by chemical beam epitaxy on an InAs (111)B substrate. Grazing incidence X-ray diffraction allows the separation of the nanowire contribution from the substrate overgrowth and gives averaged information about crystallographic phases, epitaxial relationships (with orientation distribution), and strain. In-plane strain inhomogeneities, intrinsic to the nanowires geometry, are measured and compared to atomistic simulations. Small-angle X-ray scattering evidences the hexagonal symmetry of the nanowire cross-section and provides a rough estimate of size fluctuations.
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