Bulk and interface stresses in silver-nickel multilayered thin films

Abstract

Stresses were measured in 〈111〉-textured Ag/Ni multilayered thin films from the substrate curvature and from lattice parameter measurements by x-ray diffraction. The difference between the total multilayer film stress and the layer deposition stresses can be attributed to a tensile interface stress of −2.27±0.67 J/m2. Interfacial phase formation is unlikely in this system as indicated by the exceptionally low mutual solubilities.