Initial stages of the growth of Fe on Si(111)7×7

Abstract

We present a multitechnique (scanning tunneling microscopy, photoelectron spectroscopy, and ion scattering spectroscopy) approach to study the formation of the Fe/Si(111) interface at room temperature. The first-deposited Fe atoms react with the surface, displacing Si atoms from their positions. The result is an amorphous layer with composition and density of states close to those of FeSi. On top of this reacted layer, crystallites of Fe with interdiffused Si grow. Upon further Fe deposition, the crystallite composition evolves to pure Fe.