Anodic Oxidation of Aluminum, Chromium, Hafnium, Niobium, Tantalum, Titanium, Vanadium, and Zirconium at Very Low Current Densities

Abstract

Some aspects of the mode of formation of anodic oxidation films in the potential region below oxygen evolution were examined for a number of metals under as nearly constant experimental conditions as possible. The metals selected were Al, Ti, Hf, V, Nb, Ta, and Cr. Results for Zr were reported in earlier publications. Electrolytic parameters and formation fields were evaluated from the unitary formation rates. Local currents were estimated using the method described previously.