Concepedia

Application of Ru-based gate materials for CMOS technology

M. T ̆apajna, P. Písec ̆ny, R. Lupták, K. Hus ̆eková, K. Fröhlich, L. Harmatha, Jacob C. Hooker, F. Roozeboom, J. Jergel

Materials Science in Semiconductor Processing · 2004 · 37 citations · 6 references

DOI

Concepts

References

6

Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues

E. P. Gusev, E. Cartier, D. A. Buchanan et al. · Microelectronic Engineering · 2001 · 386 citations

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Scaling the gate dielectric: Materials, integration, and reliability

D. A. Buchanan · IBM Journal of Research and Development · 1999 · 363 citations

, , +17

Electrodes for PbZr x Ti1 − x  O 3 Ferroelectric Thin Films

Dilip P. Vijay, Seshu B. Desu · Journal of The Electrochemical Society · 1993 · 170 citations

, , +17

Conducting Transition Metal Oxides: Possibilities for RuO2 in VLSI Metallization

L. Krusin‐Elbaum, M. Wittmer · Journal of The Electrochemical Society · 1988 · 119 citations

, , +17

Etching technique for ruthenium with a high etch rate and high selectivity using ozone gas

M. Nakahara, Shozo Tsunekawa, Kenji Watanabe et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 41 citations

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