Publication | Closed Access
New Phase-Transition Phenomena in Thin Argon Films
490
Citations
4
References
1977
Year
Quantum LiquidEngineeringChemistrySimple LiquidThin Argon FilmsEpitaxial GrowthThin Film ProcessingDependent Number DensitiesPhysicsPhysical ChemistryArgon FilmsQuantum ChemistryFilm ThicknessNatural SciencesSurface ScienceApplied PhysicsCondensed Matter PhysicsThin FilmsChemical Vapor Deposition
A density-functional theory capable of predicting free energies and spatially dependent number densities of simple classical fluids is applied to the case of argon films in the presence of a solid carbon dioxide substrate. For pressures less than the saturated vapor pressure, a new phase transition for which the order parameter is the film thickness is described. The phases are the usual unsaturated film and a one- or two-atomic-layer structure localized at the argon-C${\mathrm{O}}_{2}$ interface.
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