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Enhanced Self-Diffusion on Cu(111) by Trace Amounts of S: Chemical-Reaction-Limited Kinetics
61
Citations
15
References
2004
Year
EngineeringChemistryChemical EngineeringTrace AmountsIntermediate ThetaSurface ReconstructionSurface Self-diffusionPhysicsNanotechnologyMetallurgical InteractionChemisorptionElemental MetalChemical-reaction-limited KineticsSurface CharacterizationDiffusion ResistanceSurface ChemistryNatural SciencesSurface AnalysisSurface ScienceCondensed Matter PhysicsApplied PhysicsChemical KineticsSurface ReactivityS Coverage
We find that less than 0.01 monolayer of S can enhance surface self-diffusion on Cu(111) by several orders of magnitude. The measured dependence of two-dimensional island decay rates on S coverage (theta(S)) is consistent with the proposal that Cu3S3 clusters are responsible for the enhancement. Unexpectedly, the decay and ripening are diffusion limited with very low and very high theta(S) but not for intermediate theta(S). To explain this result we propose that surface mass transport in the intermediate region is limited by the rate of reaction to form Cu3S3 clusters on the terraces.
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