Plasma ion source for <i>in situ</i> ion bombardment in a soft x-ray magnetic scattering diffractometer

Abstract

A new plasma ion source for in situ keV He ion bombardment of solid state samples or thin films was designed and built for ion fluences between 1 × 10(12) and 1 × 10(17) ions/cm(2). The system was designed to be mounted to different diffraction chambers for soft x-ray resonant magnetic scattering. Without breaking the vacuum due to He-ion bombardment, structural and magnetic modifications of the samples can be studied in situ and element specifically.