Power supply with arc handling for high peak power magnetron sputtering

Abstract

High power pulsed magnetron sputtering (HPPMS) can generate a dense plasma with high target material ion content, using essentially conventional magnetron sputtering equipment. However, process arcs, which generate macroparticles and target damage, are not avoidable due especially to imperfections in vacuum system hardware and target materials. Arc handling is required for practical application of HPPMS. An experimental power supply capable of peak powers up to 3 MW, peak currents to 3000 A, at discharge voltages reaching 2 kV has been designed and built. It has voltage ring-up capability for pulse by pulse plasma ignition. This power supply technology enables the practical application of a whole range of sputtering processes, based on pulsing magnetrons operating at high peak powers. Power supply performance for typical pulses and for arc handling at peak currents into the kiloamp range is shown with temporal current and voltage characteristics of the discharge for typical pulses and for arcing operation.