Magnetic Properties of Electrochemically Deposited Ni/Cu Superlattices

Abstract

Structural and magnetic properties of Cu/Ni superlattices are reported. A single bath method under controlled potential was used. Si(100) wafers with thin films of of evaporated Cu were used as a substrate. The multilayers were plated from a sulfamate solution containing 1.5 mol/L 0.01 mol/L 0.5 mol/L at pH 3.5 and 20°C. X-ray diffraction and secondary ion mass spectroscopy were used to determine the structure, quality, and chemical composition of the multilayers. Magnetoresistance measurements were carried out using the Van der Pauw structure [Philips Tech. Rev., 22, 220 (1959).] Measurement of the magnetoresistance was made with current flowing in the plane of the multilayer. The applied magnetic field was changed from 0 to The resulting changes in the resistance were about 2.5%. © 2002 The Electrochemical Society. All rights reserved.