IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 2006 · 18 citations · 0 references
EngineeringIndustrial EngineeringSystems EngineeringEquipmentManufacturing SystemsQuality EngineeringCondition MonitoringDiagnosticsEquipment MaintenanceFault DetectionFault DiagnosisSystem MonitoringCondition Monitoring SystemsDiagnosis Of Industrial SystemsEquipment Condition MonitoringEquipment Health MonitoringEquipment MonitoringProcess Fault DetectionProcess Parameter MonitoringSlurry Flow
This paper describes development and actual utilization of a fab-wide equipment monitoring system using a secondary port separating a primary port shared by an MES and a fab-wide FDC (fault detection and classification) system. In data collection of equipment parameter, a new concept of important parameter is introduced. As an example of the fab-wide FDC, an FDC of a slurry flow rate fault in CMP equipment from the start-up is demonstrated. Moreover, in order to quantitatively estimate equipment quality, Cpk for each parameter of equipment in fab-wide is calculated and it is confirmed that equipment quality is increasing from starting up equipment.