Publication | Open Access
Influence of buffer-layer surface morphology on the self-organized growth of InAs on InP(001) nanostructures
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Citations
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References
2000
Year
Optical MaterialsEngineeringCrystal Growth TechnologyOptoelectronic DevicesSemiconductor NanostructuresSemiconductorsInp Buffer LayersMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorBuffer-layer Surface MorphologyMaterials SciencePhysicsNanotechnologyInp Buffer-layer MorphologyOptoelectronic MaterialsPhotonic MaterialsElectronic MaterialsNanomaterialsCorrugated StructuresSurface ScienceApplied PhysicsSelf-organized GrowthNanofabricationOptoelectronics
We have studied the influence of InP buffer-layer morphology in the formation of InAs nanostructures grown on InP(001) substrates by solid-source molecular-beam epitaxy. Our results demonstrate that when InP buffer layers are grown by atomic-layer molecular-beam epitaxy, InAs quantum dot-like structures are formed, whereas InP buffer layers grown by MBE produce quantum-wire-like structures. The optical properties of these corrugated structures make them potential candidates for their use in light-emitting devices at 1.55 μm.
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