Interaction of evaporated copper with vapor-deposited thin polyimide films

Thomas Strunskus, Ch. Hahn, D. Frankel, M. Grunze

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 20 citations · 0 references

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Abstract

The interaction of evaporated copper deposits with vapor-deposited, vacuum-cured thin films of pyromellitic dianhydride-oxydianiline (PMDA-ODA) polyimide was studied using x-ray photoelectron spectroscopy (XPS) and Fourier transform infrared reflection absorption spectroscopy (FTIRAS). XPS and FTIRAS measurements indicate a preferential interaction of the copper with the imide part of the molecule, some interaction with the ODA ether oxygen and only a very weak interaction with the phenyl rings. The spectral changes observed show a dependence on the rate of the copper deposition.