Plasma Etching Transfer of a Nanoporous Pattern on a Generic Substrate

Abstract

We describe a nonlithographic nanofabrication method for creating a nanoporous pattern on any substrate. The approach utilizes plasma etching through a nanoporous template to transfer the pore pattern onto the substrate. We demonstrate this method to transfer a porous alumina pattern consisting of a hexagonal array of 50 nm diam pores onto an aluminum layer. A nanoporous alumina template 0.6 m is initially created by electrochemical anodization of an aluminum film 1 m deposited on a substrate. Controlled plasma etching is then used to etch through the pores onto the aluminum layer below the pores. In this manner, we demonstrate the hexagonal array of 50 nm diam pores in the aluminum film.