Studies of pulsed and continuous microwave discharges used to deposit diamond films

Abstract

Results are presented from optical measurements of the atomic hydrogen density and the gas temperature in a reactor for depositing diamond films from the plasmas of pulsed and continuous microwave discharges at a fixed mean microwave power. The results obtained make it possible to explain the fact that the growth rate of diamond films in the plasma of a pulsed microwave discharge is larger than that in a continuous microwave discharge.