Atmospheric pressure chemical vapour deposition of tungsten doped vanadium(iv) oxide from VOCl3, water and WCl6

Abstract

Thin films of thermochromic tungsten doped VO2 on glass substrates were prepared from the atmospheric pressure chemical vapour deposition (APCVD) reaction of VOCl3,·H2O and WCl6. X-Ray diffraction (XRD) and Raman spectroscopy indicated a solid solution V1−xWxO2 (x = 0.003–0.032). XPS studies indicated the tungsten was present as W4+. The thermochromic properties of the films were investigated by Raman, XRD and reflectance/transmission measurements. These indicated that incorporation of tungsten caused a reduction in the VO2 thermochromic switching temperature of 19 °C per W atom%. The thermochromic properties of the thin films show great potential for use as an intelligent window coating.