Single‐Photon and Two‐Photon Induced Photocleavage for Monolayers of an Alkyltriethoxysilane with a Photoprotected Carboxylic Ester

Abstract

The photochemical structuring of a polysiloxane monolayer protected with a photocleavable group is shown by femtosecond laser pulses in the near infrared. These experiments suggest a two-photon induced deprotection process that holds great promise for near-field monolayer photolithography far below the diffraction limit.