Synthesis and characterization of photosensitive polyimides

Abstract

Abstract All aromatic polyimides bearing diarylsulfide linkages in the main chain were prepared either by condensation of a sulfur containing dianhydride with an aromatic diamine or the condensation of a sulfur containing aromatic diamine with a dianhydride. Phenylation with diphenyl iodonium salts was then used to convert the diarylsulfide groups to triarylsulfonium salts. The resulting photosensitive polyimides were shown to undergo main chain cleavage during photolysis using UV irradiation. These new polyimides are candidates for positive working, high temperature photoresist materials.