Dielectric properties of Mg-doped Ba0.96Ca0.04Ti0.84Zr0.16O3 thin films fabricated by metalorganic decomposition method

Abstract

Mg-doped Ba0.96Ca0.04Ti0.84Zr0.16O3 (BCTZ) thin films have been proposed as a promising material for microelectronic device applications based on high dielectric materials. Perovskite polycrystalline Mg-doped BCTZ thin films were fabricated on a Pt/Ti/SiO2/Si substrate by metalorganic decomposition method. Dielectric properties were improved after a Pt/Mg-doped BCTZ thin film/Pt capacitor was post-annealed at 700 °C in O2 atmosphere for 30 min. A high dielectric constant of 460 at 1 MHz, a low dissipation factor less than 4.5%, and a low leakage current density of 4×10−7 A/cm2 at 3 V were obtained. Improved dielectric properties were discussed in conjunction with reduction of oxygen vacancies and electrons due to the post-annealing and Mg dopants.