Publication | Closed Access
Determination of the argon content of sputtered SiO2 films by X-ray fluorescence
26
Citations
7
References
1969
Year
Materials ScienceEngineeringSputtered Sio2 FilmsOptical PropertiesOxide ElectronicsSurface ScienceApplied PhysicsArgon ContentThin FilmsSilicon On InsulatorChemical Vapor DepositionThin Film ProcessingX-ray Fluorescence
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