Lateral Nanopatterns in Thin Diblock Copolymer Films Induced by Selective Solvents

Abstract

ADVERTISEMENT RETURN TO ISSUEPREVNoteNEXTLateral Nanopatterns in Thin Diblock Copolymer Films Induced by Selective SolventsYongzhong Chen, Haiying Huang, Zhijun Hu, and Tianbai HeView Author Information State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun, 130022, People's Republic of China Cite this: Langmuir 2004, 20, 9, 3805–3808Publication Date (Web):March 20, 2004Publication History Received5 November 2003Revised19 February 2004Published online20 March 2004Published inissue 1 April 2004https://pubs.acs.org/doi/10.1021/la0360815https://doi.org/10.1021/la0360815brief-reportACS PublicationsCopyright © 2004 American Chemical SocietyRequest reuse permissionsArticle Views885Altmetric-Citations50LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Copolymers,Ketones,Organic compounds,Solvents,Thin films Get e-Alerts