Publication | Open Access
Flux Line Shear Studied in Sputtered NbN Films
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1987
Year
Materials EngineeringMaterials ScienceEpitaxial GrowthMaterial AnalysisEngineeringPhysicsSputtered Nbn FilmsCritical Current DensitySurface ScienceApplied PhysicsSuperconductivityCondensed Matter PhysicsThin FilmsGrain SizeDepth-graded Multilayer CoatingThin Film Processing
It is shown that above B≈0.5B c2 , the critical current density of sputtered NBN films is limited by flux line shear.The channel width for shear is determined by the lattice spacing rather than by the grain size.