PECVD of amorphous TiO2 thin films: effect of growth temperature and plasma gas composition - Concepedia

Concepedia

Publication | Closed Access

PECVD of amorphous TiO2 thin films: effect of growth temperature and plasma gas composition

151

Citations

19

References

2000

Year

Giovanni A. Battiston, R. Gerbasi, A. Gregori, Marina Porchia, Sandro Cattarin, Gian Andrea Rizzi

Thin Solid Films

Materials ScienceMaterial AnalysisGrowth TemperatureEngineeringApplied PhysicsPlasma Gas CompositionThin FilmsAmorphous SolidChemical Vapor DepositionThin Film Processing

References

	Year	Citations

Page 1