Publication | Closed Access

Temperature coefficient of resistivity of TiAlN films deposited by radio frequency magnetron sputtering

Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringSpecific ResistanceApplied PhysicsTialn FilmsTemperature CoefficientSemiconductor MaterialRadio Frequency MagnetronMicroelectronicsChemical Vapor DepositionThin Film ProcessingElectrical Insulation