Publication | Open Access
Electric‐Field Screening in Atomically Thin Layers of MoS<sub>2</sub>: the Role of Interlayer Coupling
163
Citations
39
References
2012
Year
Mos2 SheetsEngineeringTwo-dimensional MaterialsSemiconductorsAtomically Thin LayersInterlayer CouplingQuantum MaterialsElectric FieldMaterials ScienceOxide HeterostructuresPhysicsCrystalline DefectsSemiconductor MaterialLayered MaterialSurface CharacterizationTransition Metal ChalcogenidesElectrostatic ScreeningSurface ScienceCondensed Matter PhysicsApplied PhysicsElectric‐field ScreeningMultilayer HeterostructuresThin Films
The electrostatic screening in single and few-layer MoS2 sheets is studied. Electrostatic force microscopy is used to probe the electric field generated by charge impurities in the substrate and incompletely screened by MoS2 sheets. A non-linear Thomas–Fermi theory is employed to interpret the experimental results, demonstrating the important role of the interlayer coupling in the screening of MoS2.
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