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High near-infrared reflectivity modulation with polycrystalline electrochromic WO3 films
81
Citations
3
References
1983
Year
Optical MaterialsEngineeringLuminescent GlassThin Film Process TechnologyLuminescence PropertyOptical PropertiesThin Film ProcessingMaterials ScienceOptoelectronic MaterialsReflectivity ModulationNear-infrared ReflectivityMaterial AnalysisElectronic MaterialsInfrared SensorSurface ScienceApplied PhysicsThin FilmsWo3 FilmOptoelectronics
A near-infrared reflectivity exceeding 60% at 2.5-μm wavelength has been observed for a polycrystalline, rf sputter-deposited electrochromic (EC) WO3 film in a deeply colored state. This reflectivity is considerably higher than that previously reported for a thermally evaporated EC-WO3 film that was crystallized by a post-deposition thermal anneal. The shapes of the x-ray spectra of the two films are also different. The results of ellipsometry measurements of the optical constants provide convincing evidence for the validity of a free-electron Drude model to explain the reflectivity modulation observed in polycrystalline EC-WO3.
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