Applied Physics Letters · 1988 · 13 citations · 3 references
Materials ScienceEngineeringElectron MicroscopyCritical Current DensityOxide ElectronicsSurface ScienceApplied PhysicsSuperconductivityIon Beam SputteringThin Film DevicesThin Film Process TechnologyThin FilmsEpitaxial GrowthChemical Vapor DepositionThin Film ProcessingThin-film Technology
High quality Y-Ba-Cu-O thin films were successfully prepared by using ion beam sputtering. Zero resistance was reached at 90 K. The critical current density at 77 K was 4–5×104 A/cm2. The surface morphology of the films was observed by scanning electron microscopy.
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Youichi Enomoto, Toshiaki Murakami, Minoru Suzuki et al. · Japanese Journal of Applied Physics · 1987 · 403 citations
Superconducting Material, Engineering, Thin Film Process Technology +18