Publication | Closed Access
Structural and dielectric properties of Ti and Er co-doped HfO2 gate dielectrics grown by RF sputtering
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Citations
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References
2012
Year
Materials ScienceMaterials EngineeringElectrical EngineeringDielectric PropertiesEngineeringRf SemiconductorNanoelectronicsOxide ElectronicsApplied PhysicsSemiconductor MaterialMicroelectronicsSemiconductor Device
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