Applied Physics Letters · 2005 · 350 citations · 13 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsDopingLight-emitting DiodesOptoelectronic DevicesSemiconductor Device MaterialsSemiconductor HeterostructuresWide Band Gap SemiconductorsBand GapBand Gap EngineeringElectroluminescenceGallium NitrideGallium Nitride (Gan) MaterialsGallium Nitride Light-emitting DiodesOptical Band GapThreshold Voltage
We report on the characteristics of a ZnO light-emitting diode (LED) comprised of a heterostructure of p-ZnO/n-GaN. The LED structure consisted of a phosphorus doped p-ZnO film with a hole concentration of 6.68×1017cm−3 and a Si-doped n-GaN film with an electron concentration of 1.1×1018cm−3. The I–V of the LED showed a threshold voltage of 5.4 V and an electroluminescence (EL) emission of 409 nm at room temperature. The EL emission peak at 409 nm was attributed to the band gap of p-ZnO which was reduced as the result of the band offset at the interface of p-ZnO and n-GaN.
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ZnO diode fabricated by excimer-laser doping
Toru Aoki, Yoshinori Hatanaka, D. C. Look · Applied Physics Letters · 2000 · 714 citations · Full text