Ultraviolet depolymerization of photoresist polymers

Abstract

Abstract A new method for removal of thin films of photoresist polymers has been found. When polymeric films are exposed to ultraviolet light in the presence of air, the material can be removed leaving an extremely clean surface, free of carbonaceous material. This process has been examined for a variety of photoresist polymers as well as on nonphotoresist polymers and on a variety of substrates. The process offers a new method of photoresist removal.