Publication | Closed Access
Low-temperature, chemically driven atomic-layer epitaxy: <i>In situ</i> monitored growth of CdS/ZnSe(100)
22
Citations
12
References
1997
Year
EngineeringChemistrySemiconductor NanostructuresSemiconductorsIi-vi SemiconductorAtomic-layer EpitaxyMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorMaterials ScienceCrystalline DefectsPhysicsNanotechnologyChemical Reaction SchemeIon ProbesIi–vi SemiconductorsNatural SciencesApplied PhysicsThin FilmsChemical Vapor Deposition
A chemical reaction scheme for room-temperature atomic-layer epitaxial growth of II–VI semiconductors is described and demonstrated. Growth is accomplished by dosing in an ultra-high-vacuum chamber, and the surface structure and composition is probed in situ by a variety of electron and ion probes.
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