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Influence of photoexcitation on hopping conduction in neutron-transmutation-doped GaAs
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Citations
16
References
1988
Year
SemiconductorsSemiconductor TechnologyCategoryquantum ElectronicsTunneling-assisted Hopping ConductionEngineeringPhysicsCrystalline DefectsTunneling MicroscopyApplied PhysicsCondensed Matter PhysicsQuantum MaterialsAtomic PhysicsNeutron-transmutation-doped GaasSemiconductor MaterialHopping ConductionPhoton EnergyOptoelectronicsCompound Semiconductor
The nature of the tunneling-assisted hopping conduction in neutron-transmutation-doped GaAs has been studied under photoexcitation with a photon energy of 1.32 eV. It is found that the dopants activated by annealing around 400 °C provide the electrons to the defect levels originating the hopping conduction even when under photoexcitation. The hopping conduction under photoexcitation is affected by quenching in photoconductance below 120 K concerned with the main electron trap (EL2) and/or the As antisite defect (AsGa) induced by the neutron irradiation. The photoconductance of the samples with a lower radiation damage, AsGa≤1×1018 cm−3, consists of the coexistence of the hopping and band conductions.
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