Japanese Journal of Applied Physics · 1996 · 65 citations · 7 references
Aluminium NitrideElectrical Engineering20-Nm Island ElectrodeEngineering100-K OperationNanoelectronicsElectronic EngineeringApplied PhysicsSemiconductor Device FabricationMicroelectronicsStandard Electron-beam LithographyThree-angle Shadow EvaporationSemiconductor Device
We have made Al-based single-electron transistors with an artificially fabricated 20-nm island electrode by utilizing standard electron-beam lithography and three-angle shadow evaporation. A periodic gate-voltage dependence of current at above 100 K is demonstrated with this device. In addition, we increased the charging energy about 20% by using anodization.
7
Noise in the Coulomb blockade electrometer
Gregory A. Zimmerli, Travis M. Eiles, R. L. Kautz et al. · Applied Physics Letters · 1992 · 187 citations
Quantum Science, Electrical Engineering, Noise Mitigation +15
Broadband single-electron tunneling transistor
E. H. Visscher, J. Lindeman, S. M. Verbrugh et al. · Applied Physics Letters · 1996 · 49 citations
Electrical Engineering, Engineering, Tunneling Microscopy +11