Publication | Closed Access
Ferroelectric thin films: Review of materials, properties, and applications
1.8K
Citations
330
References
2006
Year
Materials ScienceMaterials EngineeringMultiferroicsPolarization ReversalEngineeringElectronic MaterialsFerroelectric ApplicationNanotechnologyApplied PhysicsFerroelectric MaterialsThin Film MaterialsPiezoelectric MaterialMagnetic Thin FilmsThin FilmsFerroelectric Thin FilmsPiezoelectric NonlinearityFunctional Materials
This review surveys the current state of ferroelectric thin films. It covers applications in microsystems, high‑frequency electronics, and ferroelectric memories, discusses materials, domain structure, size effects, and key properties such as polarization reversal, piezoelectric nonlinearity, permittivity, loss, and nanoscale probing techniques. The review highlights emerging areas of multiferroic materials and ferroelectric one‑dimensional nanostructures.
An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems’ applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems’ applications, and permittivity and loss in ferroelectric films—important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures.
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