Intelligent Window Coatings:  Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide

Abstract

Thin films of tungsten-doped vanadium(IV) oxide were prepared on glass substrates from the atmospheric pressure chemical vapor deposition of vanadium(IV) chloride, tungsten(VI) ethoxide, and water at 500−600 °C. The films were characterized by Raman microscopy, glancing angle X-ray diffraction (GAXRD), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering (RBS), scanning electron microscopy (SEM), and vis/IR reflectance−transmittance. The films showed a reduction in thermochromic transition temperatures from 68 °C in VO 2 to 42 °C in V 0.99 W 0.01 O 2 approaching that required for commercial use as an intelligent window coating.