Entangled-State Lithography: Tailoring Any Pattern with a Single State

Abstract

We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1) x (N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.