CVD deposition of cobalt oxide (CO₃O₄) from Co(acac)₂

Abstract

Cobalt oxides are interesting materials for catalytic applications. Their deposition by CVD methods, however, have been rarely studied to date. In this work, cobalt(Il)-acetylacetonate, Co(acac)(2), Was used as metalorganic precursor together with oxygen, to deposit Co3O4 on steel and silicon dioxide substrates in an atmospheric cold-wall CVD reactor. The morphology and growth rate as a function of temperature, flow rate and oxygen partial pressure was studied. Growth was found between 200 and 500 degreesC. The samples were analysed by SEM, UV-Vis spectroscopy and XRD. The morphology as well as the growth rate may be varied in a wide parameter range from smooth films to dendritic growth. Some samples were also tested for their catalytic activity in propane oxidation.