Publication | Closed Access
Implanted-Barrier Two-Phase Charge-Coupled Device
35
Citations
3
References
1971
Year
Low-power ElectronicsElectrical EngineeringEngineeringCharge-coupled DeviceNanoelectronicsApplied PhysicsComputer EngineeringWireless Implantable DeviceImplanted ChargeBeyond CmosElectrophysiologyCharge SeparationImplantable DeviceMicroelectronicsIon-implanted BarrierElectrochemistryElectronic Circuit
A new kind of charge-coupled device (CCD) utilizing an ion-implanted barrier and only two nonoverlapping electrodes per bit is described. The use of implanted charge substantially simplifies device structure. The two-electrode-per-bit configuration permits operation with only one clock. In addition, the device performs better than any previously reported CCD with a loss per transfer of less than 0. 1% up to 6. 5 MHz and 2% at 17 MHz.
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