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Determination of Interlayer Diffusion Parameters for Ag/Ag(111)
38
Citations
12
References
2000
Year
Materials EngineeringMaterials ScienceSurface CharacterizationEngineeringTunneling MicroscopyPhysicsEpitaxial SystemDiffusion ResistanceSurface AnalysisSurface ScienceCondensed Matter PhysicsApplied PhysicsInterlayer Diffusion ParametersMolecular Beam EpitaxyEpitaxial GrowthWide Coverage RangeLower Layer
It is well known that the Ag/Ag(111) epitaxial system grows three dimensionally because of the existence of a relatively high excess diffusion barrier, DeltaE(s) = 0.13 eV, at the step edges. Several experimental methods have been developed to measure the step edge barrier in this system over a wide coverage range. The probability for an atom to move from a higher to a lower layer depends on both the barrier and the prefactor, so it is important to test whether the prefactors for hopping over a step, nu(s), and for hopping on a terrace, nu(t), are different. We present the results from several experiments on Ag/Ag(111) to conclude that nu(s)/nu(t) = 10(2.0+/-0. 3).
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